Nanopatterning, production and applications based on nanoimprinting lithography

Description

The NaPANIL project aims to develop processes, materials and tools, both for manufacturing and for control, for truly 3-dimensional nanosurfaces with feature dimensions ranging from 50 nm to several m. The nanosurfaces will be realised using various variants of nanoimprinting lithography. The dedicated application is to control light at nanostructured surfaces and a few potential high impact products have been identified by the end-user partners in the consortium. Design, demonstration and prototyping these applications will act as test-bench for the new manufacturing paradigm. The manufacturing processes possess generic aspects for production of any kind of topographically 3-dimensional nanostructured surfaces. In the R&D of nanoimprinting Europe has a leading position. The NaPANIL consortium combines the best expertise and know how in field to reach the goals in the project.

KEY DATES
  • Status
  • Completed
  • Project Launch
  • 01 May 2008
  • Project completed
  • 30 April 2012
nano-technology nano-imprinting lithography 3-dimensional nano-surfaces
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